PaperSilylation of resist materials using di- and polyfunctional organosilicon compoundsE. Babich, J. Paraszczak, et al.Microelectronic Engineering
PaperApplication of block-copolymer supramolecular assembly for the fabrication of complex TiO2 nanostructuresSung Ho Kim, Oun-Ho Park, et al.Small
PaperThermally Developable, Positive Resist Systems with High SensitivityHiroshi Ito, Reinhold SchwalmJES