Mukesh Khare, S. Ku, et al.
IEDM 2002
Inspection of complementary metal-oxide-semiconductor circuits by electron-beam charging is demonstrated. Isolation of the gate electrodes used in the actual circuits is verified. The inspection is done entirely without contact, without removing wafers from the clean room, and prior to metal and interlevel dielectric deposition.
Mukesh Khare, S. Ku, et al.
IEDM 2002
W.-H. Lee, A. Waite, et al.
IEDM 2005
D. Boerstler, Keith A. Jenkins
VLSI Circuits 1998
Young H. Lee, Mao-Min Chen, et al.
Applied Physics Letters