Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
We have implemented the so-called local density approximation (LDA) plus the Hubbard parameter U method (LDA+U), in a formalism based on the projector augmented wave (PAW) method and calculated the ground-state properties of NiO and its optical properties. Good agreement with the measured ground-state antiferromagnetic magnetic moment and optical properties are obtained for U = 5 eV. The enhancement of the O 2p near the top of the valence states increases with the value of U. At intermediate U, the nature of the band gap is a mixture of charge transfer and Ni d → d excitations. © 2000 Elsevier Science B.V. All rights reserved.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
A. Krol, C.J. Sher, et al.
Surface Science
Zelek S. Herman, Robert F. Kirchner, et al.
Inorganic Chemistry
P. Alnot, D.J. Auerbach, et al.
Surface Science