PaperCyclic olefm resist polymers and polymerizations for improved etch resistanceR.D. Allen, Juliann Opitz, et al.J. Photopolym. Sci. Tech.
Conference paperNovel photoresist design based on electrophilic aromatic substitutionB. Reck, R.D. Allen, et al.SPE Regional Technical Conference 1988
Conference paperPolymer platform dependent characteristics of 193 nm photoresistsJuliann Opitz, R.D. Allen, et al.SPIE Advances in Resist Technology and Processing 1999
PaperFluoroalcohol-methacrylate resists for 193nm lithographyP.R. Varanasi, R.W. Kwong, et al.J. Photopolym. Sci. Tech.