Conference paper
Acid-catalyzed single-layer resists for ArF lithography
Roderick R. Kunz, Robert D. Allen, et al.
Microlithography 1993
The relative rates of varying Nb/Nb-TBE monomer feed ratios were evaluated by using real-time monitoring via in-situ FTIR spectroscopy of alternating copolymerizations of MA with Nb and Nb-TBE. Pseudo first order kinetic plots constructed from the in-situ FTIR absorbance data indicated that the rate of reaction is a strong function of the Nb/Nb-TBE ratio and decreased with increasing Nb-TBE.
Roderick R. Kunz, Robert D. Allen, et al.
Microlithography 1993
Robert D. Allen, Young-Hye Na, et al.
J. Photopolym. Sci. Tech.
Anthony J. Pasquale, Timothy E. Long, et al.
Journal of Adhesion
Daniel P. Sanders, Linda K. Sundberg, et al.
SPIE Advanced Lithography 2007