A. Ney, R. Rajaram, et al.
Journal of Magnetism and Magnetic Materials
Review
Trends in patterning materials for advanced lithography
Abstract
The emerging trends in photoresists and advanced patterning materials are described, including functional fluoropolymers, molecular glasses, and imprint resists. ©2007TAPJ.
Related
I.K. Pour, D.J. Krajnovich, et al.
SPIE Optical Materials for High Average Power Lasers 1992
Robert W. Keyes
Physical Review B
J.H. Kaufman, Owen R. Melroy, et al.
Synthetic Metals