Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Paper
Sturm-Liouville systems with potentials 0.5 cos 2nx
Related
Hang-Yip Liu, Steffen Schulze, et al.
Proceedings of SPIE - The International Society for Optical Engineering
Leo Liberti, James Ostrowski
Journal of Global Optimization
Conference paper
Motion video analysis using planar parallax
Harpreet S. Sawhney
IS&T/SPIE Electronic Imaging 1994