Ranulfo Allen, John Baglin, et al.
J. Photopolym. Sci. Tech.
The adsorption site of N and O on Ni(100) for a c(2×2) overlayer is determined by x-ray-absorption fine-structure measurements. The O atoms adsorb in the fourfold hollow site on the unreconstructed surface with an O-Ni distance of R1=1.97(2) and d =0.88(4) above the first Ni layer. The N atoms also occupy a fourfold hollow site with a bond length of R1=1.89(3) but the nearest Ni atoms are rotated by a tangential displacement of =0.68(10), such that d =0.11(6). The differences in the bonding of N and O are linked to the occupation of their 2p levels. © 1987 The American Physical Society.
Ranulfo Allen, John Baglin, et al.
J. Photopolym. Sci. Tech.
Biancun Xie, Madhavan Swaminathan, et al.
EMC 2011
Sharee J. McNab, Richard J. Blaikie
Materials Research Society Symposium - Proceedings
K.N. Tu
Materials Science and Engineering: A