P.J. Wang, T.F. Kuech, et al.
Journal of Applied Physics
The stability of the luminescence from porous Si has been improved by rapid thermal oxidation. As-prepared and oxidized samples have been compared by cathodoluminescence and photoluminescence. Electron beam excitation resulted in rapid decay of the porous Si emission from as-prepared samples. Photoluminescence measurements from as-prepared samples in oxygen showed a similar degradation. In contrast, the rapid thermal oxidized samples showed a dramatic improvement in stability under either electron beam or photoexcitation.
P.J. Wang, T.F. Kuech, et al.
Journal of Applied Physics
J.C. Tsang, M.A. Tischler, et al.
Applied Physics Letters
D.B. Beach, R.T. Collins, et al.
MRS Proceedings 1992
R.T. Collins, M.A. Tischler, et al.
Applied Physics Letters