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SPIE Photomask Technology + EUV Lithography 2011
In this paper, we develop a framework suitable for performing a multiresolution analysis using univariate spline spaces of arbitrary degree and with non-uniform knot-sequences. To this end, we show, among other things, the existence of compactly supported prewavelets and of prewavelets that are globally supported, but decay exponentially. In each case we obtain a decomposition of a fine spline space as a sum of a coarse spline space plus a spline space spanned by prewavelets. © 1992 Springer-Verlag.
Moutaz Fakhry, Yuri Granik, et al.
SPIE Photomask Technology + EUV Lithography 2011
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Photomask and Next-Generation Lithography Mask Technology 2004
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