Accounts of Chemical Research

Paper

01 May 2002

Silicon Chemical Vapor Deposition One Step at a Time: Fundamental Studies of Silicon Hydride Chemistry

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Abstract

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Paper

Observation and characterization of near-UV transients formed in disilane photodissociation at 193 nm

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Chemical Physics Letters

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Effect of plasma interactions with low-κ films as a function of porosity, plasma chemistry, and temperature

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Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

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Product Branching in Infrared Multiple Photon Decomposition of Gas-Phase Ions. Mechanistic Implications for Proton-Transfer Reactions

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JACS

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Effect of low-frequency radio frequency on plasma-enhanced chemical vapor deposited ultra low-κ dielectric films for very large-scale integrated interconnects

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