The DX centre
T.N. Morgan
Semiconductor Science and Technology
The influence of thermal annealing on Sb/GaAs(110) interfaces is studied in situ by high-resolution photoemission spectroscopy. A detailed line-shape analysis of the Sb 4d core-level spectra shows that Sb deposition at room temperature (RT) does not lead to perfectly ordered growth of the first monolayer (ML), as was assumed so far. Annealing at 330°C results in a highly ordered overlayer that is desorption limited to 1 ML. The degree of order affects the barrier height at the interface drastically: While RT deposition pins the Fermi level 0.6 eV above valence-band maximum for p-type GaAs, we find a reduction in the band bending by a factor of 2 after annealing. © 1987 The American Physical Society.
T.N. Morgan
Semiconductor Science and Technology
F.J. Himpsel, T.A. Jung, et al.
Surface Review and Letters
Oliver Schilter, Alain Vaucher, et al.
Digital Discovery
S. Cohen, T.O. Sedgwick, et al.
MRS Proceedings 1983