PaperAnnealing of residual stress in silicon monoxide films [1]J.R. Priest, H.L. CaswellBritish Journal of Applied Physics
PaperStress Anisotropy in Silicon Oxide FilmsJ.R. Priest, H.L. Caswell, et al.Journal of Applied Physics
PaperFormation of thin film circuits using preferential nucleationH.L. Caswell, Y. BudoSolid-State Electronics
PaperCharacteristics of the annealing kinetics of tin films deposited at 88°KJ.R. Priest, C. Chiou, et al.Journal of Applied Physics
