PaperCharacteristics of the annealing kinetics of tin films deposited at 88°KJ.R. Priest, C. Chiou, et al.Journal of Applied Physics
PaperStress Anisotropy in Silicon Oxide FilmsJ.R. Priest, H.L. Caswell, et al.Journal of Applied Physics
PaperInfluence of oxygen on the surface mobility of tin atoms in thin filmsH.L. Caswell, Y. BudoJournal of Applied Physics
PaperAnnealing of residual stress in silicon monoxide films [1]J.R. Priest, H.L. CaswellBritish Journal of Applied Physics
