British Journal of Applied Physics

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20 Nov 2002

Annealing of residual stress in silicon monoxide films [1]

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Abstract

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Role of the intermetallic compounds in determining the superconducting transition temperature of superimposed metal films

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Physics Letters

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Low-temperature properties of evaporated lead films

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Characteristics of the annealing kinetics of tin films deposited at 88°K

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Influence of oxygen on the surface mobility of tin atoms in thin films

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