O. Thomas, F.M. D’Heurle, et al.
Philosophical Magazine B: Physics of Condensed Matter; Statistical Mechanics, Electronic, Optical and Magnetic Properties
The behaviors of metallic bilayers, chromium-molybdenum and chromium-tungsten, on (100) silicon during isochronal annealing have been studied by Rutherford backscattering of 2.3-MeV 4He+ ions and x-ray diffraction. These experiments were conducted with the aim of obtaining information about the respective mobilities of silicon and metal atoms in the different silicides through a comparison of the temperatures at which the silicides form and those at which they mix (through metal-atom diffusion). The results confirm that the respective silicides form via silicon-atom motion and that the mobilities of the metal atoms are markedly smaller than that of the silicon atoms.
O. Thomas, F.M. D’Heurle, et al.
Philosophical Magazine B: Physics of Condensed Matter; Statistical Mechanics, Electronic, Optical and Magnetic Properties
P. Gas, G. Scilla, et al.
Journal of Applied Physics
C. Lavoie, C. Cabral Jr., et al.
Journal of Electronic Materials
O. Thomas, G. Scilla, et al.
Applied Surface Science