E. Occhiello, F. Garbassi, et al.
Journal of Physics D: Applied Physics
The plasma-assisted etching of magnetron-sputtered polycrystalline tungsten films in CF4-H2 and CF4-O2 glow discharges has been studied as a function of ion energy using quartz-crystal microbalance methods supplemented by vacuum-transfer Auger electron spectroscopy and actinometric emission spectroscopy.
E. Occhiello, F. Garbassi, et al.
Journal of Physics D: Applied Physics
J.W. Coburn
Physica Scripta
J.W. Coburn, K. Koehler
Symposium on Plasma Processing 1986
J.W. Coburn, Eric Kay
Applied Physics Letters