PLASMA POTENTIALS IN rf GLOW DISCHARGES.
J.W. Coburn, K. Koehler
Symposium on Plasma Processing 1986
A bakable ultrahigh vacuum system has been constructed to sample the particle flux incident on the substrate of a planar diode sputtering system. A beam of particles from the discharge is extracted into a long mean free path environment where it passes through a 90° deflection electrostatic analyzer into a quadrupole residual gas analyzer. The mass spectra of positive ions incident on a substrate during dc sputtering of copper and aluminum bronze are shown and the influence of hydrogen contamination is illustrated. The energy distribution of the Ar+ ions is presented for several values of the substrate bias. © 1970 The American Institute of Physics.
J.W. Coburn, K. Koehler
Symposium on Plasma Processing 1986
Harold F. Winters, J.W. Coburn, et al.
JVSTA
J.W. Coburn
Pure and Applied Chemistry
V.J. Minkiewicz, M. Chen, et al.
Applied Physics Letters