PaperPolymer degradation in reactive ion etching and its possible application to all dry processesH. Hiraoka, L.W. Welsh Jr.Radiation Physics and Chemistry
Conference paperSoft vacuum pulsed electron beam processing of teflon and teflon-like filmsJ. Krishnaswamy, G.J. Collins, et al.Proceedings of SPIE 1989
PaperLaser-photoetching characteristics of polymers with dopantsT.J. Chuang, H. Hiraoka, et al.Applied Physics A Solids and Surfaces
