Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Paraelectric resonance is used to study the tunneling behavior of OH- in both as-grown and annealed KCl crystals. The differences observed between the two types of crystals indicate that internal stresses broaden the resonance lines, and in as-grown crystals internal stresses displace the energy levels within the lowest manifold of tunneling states. © 1969.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Hiroshi Ito, Reinhold Schwalm
JES
Sharee J. McNab, Richard J. Blaikie
Materials Research Society Symposium - Proceedings
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MRS Proceedings 1983