On the replication of block copolymer templates by poly(dimethylsiloxane) elastomers

Abstract

Recently there were considerable interest in fabricating sub-micrometer and nanometer-scale structures. The ability to pattern surfaces with regularly sized and spaced features on the nanoscopic level was desirable for many potential applications. Thus, block copolymers offer an attractive route to overcome some of the limitation of conventional lithographic techniques, since they self-assemble into a variety of ordered morphologies on the length scale of tens of nanometers.