Julien Autebert, Aditya Kashyap, et al.
Langmuir
A grain-boundary-dislocation mechanism for diffusion-induced boundary migration is proposed. It is suggested that point-defect emission from grain-boundary dislocations is necessary for the solution and transport of substitutional solutes. Grain-boundary migration occurs as a by-product of the emission of point defects, owing to the requirement that the dislocation remain in the grain-boundary plane. © 1981 Taylor & Francis Group, LLC.
Julien Autebert, Aditya Kashyap, et al.
Langmuir
A. Nagarajan, S. Mukherjee, et al.
Journal of Applied Mechanics, Transactions ASME
J.C. Marinace
JES
S.F. Fan, W.B. Yun, et al.
Proceedings of SPIE 1989