J.A. Van Vechten
JES
In the accompanying paper we have given evidence that pulsed laser annealing of Si does not involve normal thermal melting and recrystallization. Here we argue the importance of the electron-hole plasma produced by the laser to the annealing process. © 1979.
J.A. Van Vechten
JES
R. Tsu, L. Esaki
Applied Physics Letters
R. Tsu, F.C. Whitmore
Physics Letters A
L.L. Chang, L. Esaki, et al.
Applied Physics Letters