J.M. Shaw, M. Hatzakis
JES
Electron penetration and scattering in solids can be measured by electron beam exposure of a positive electron resist. The beam profile is obtained by exposing a long line of controlled width in a thick layer of poly-(methyl methacrylate) resist. The cross section of the developed line which can be examined in the scanning electron microscope represents the beam density profile. © 1971 The American Institute of Physics.
J.M. Shaw, M. Hatzakis
JES
H.N. Yu, R.H. Dennard, et al.
ISSCC 1973
K.J. Stewart, J.M. Shaw, et al.
Symposium on Patterning Science and Technology 1989
E. Babich, J. Paraszczak, et al.
Microelectronic Engineering