American Chemical Society, Polymer Preprints, Division of Polymer Chemistry
Paper
01 Apr 1997

Mechanistic studies of chemically amplified photoresists

Related

Paper

Kinetic model for positive tone resist dissolution and roughening

F.A. Houle, W.D. Hinsberg, et al.

Macromolecules

Paper

Factors controlling pattern formation in chemically amplified resists at sub-100 nm dimensions

W.D. Hinsberg, F.A. Houle, et al.

J. Photopolym. Sci. Tech.

Paper

Laser chemical vapor deposition of copper

F.A. Houle, C.R. Jones, et al.

Applied Physics Letters

Paper

Characterization of reactive dissolution and swelling of polymer films using a quartz crystal microbalance and visible and infrared reflectance spectroscopy

W.D. Hinsberg, F.A. Houle, et al.

Macromolecules

View all publications
  1. Home
  2. ↳ Publications

Date

01 Apr 1997

Publication

American Chemical Society, Polymer Preprints, Division of Polymer Chemistry

Authors

  • W.D. Hinsberg
  • G.M. Wallraff
  • F.A. Houle
  • J.E. Frommer
  • R. Beyers
IBM-affiliated at time of publication

Share