Paper
Pattern transfer
J.W. Coburn
Superlattices and Microstructures
The application of a magnetic field to control the spatial distribution of chemical species in reactive plasma etching produces a situation in which either etching or deposition can occur. In a low-voltage hot-filament triode configuration in which the plasma is confined by an externally applied magnetic field, Si samples are subjected to a CF4 plasma. Etching or deposition of a cross-linked fluorocarbon polymer can occur, depending on the position of the sample with respect to the core of the discharge. These results are generally applicable to all reactive plasma-etching reactors.
J.W. Coburn
Superlattices and Microstructures
Harold F. Winters, J.W. Coburn
Applied Physics Letters
J.W. Coburn
Physica Scripta
M. Chen, V.J. Minkiewicz, et al.
JES