O.F. Schirmer, W. Berlinger, et al.
Solid State Communications
Laser cleaning was demonstrated to be a new, promising approach to efficiently remove particulate contamination of micron and submicron size from wafer surfaces as well as from the surface and trenches of thin silicon membrane stencil masks as used for e-beam projection lithography. © 1991.
O.F. Schirmer, W. Berlinger, et al.
Solid State Communications
H.D. Dulman, R.H. Pantell, et al.
Physical Review B
Mark W. Dowley
Solid State Communications
R. Ghez, M.B. Small
JES