Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
The thermally activated inversion of Kr-Xe bilayers on Pd is studied with the use of photoemission and photon-excited Auger spectroscopy. Bilayers formed by the deposit of a monolayer or less of Xe on top of a monolayer of Kr on Pd at 49 K are shown to invert when the temperature is raised, with Xe coming in direct contact with the substrate. For a Pd(111) substrate the activation energy of this inversion process is determined: Ea=0.120.03 eV. © 1982 The American Physical Society.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
K.N. Tu
Materials Science and Engineering: A
J.A. Barker, D. Henderson, et al.
Molecular Physics
Corneliu Constantinescu
SPIE Optical Engineering + Applications 2009