High resolution metal lift-off characterization

Abstract

This project explores the challenges associated with the scaling of the standard metal lift off process to the 0.13um technology node using DUV lithography. The analysis will be done on a sequence of nested lines and spaces using a phase shift mask. PROLITH, a powerful Lithography simulation tool, will be employed to streamline the lithography optimization segment of the process. Experimental manipulation of the focus, dose and other optical parameters during exposure will then be evaluated through top-down and cross-section SEM images. Process modifications for improved linewidth and undercut control are recommended.