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SPIE Photomask Technology + EUV Lithography 2011
We consider the High-Multiplicity Cyclic Job Shop Scheduling Problem. There are two objectives of interest: the cycle time and the flow time. We give several approximation algorithms after showing that a very restricted case is APX-hard. © 2008 Elsevier B.V. All rights reserved.
Moutaz Fakhry, Yuri Granik, et al.
SPIE Photomask Technology + EUV Lithography 2011
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Ann. Math. Artif. Intell.
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SPIE Photomask Technology + EUV Lithography 2009
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AAAI 2025