Veeresh Deshpande, Vladimir Djara, et al.
Japanese Journal of Applied Physics
We developed an Al2O3/HfO2 bi-layer gate dielectric with an in-situ O3 treatment for interface state density (Dit) and gate leakage current density (Jg) reductions on SiGe channels. We observed Ge-content dependent equivalent oxide thickness (EOT) scaling and EOT 0.44 nm was achieved with an MOS capacitor with a Si0.05Ge0.95 substrate. The O3 treatment enabled application to non-planar device structures and we demonstrated five orders of magnitude lower off currents (Ioff), a sub-threshold slope of 68 mV/decade, and a very high hole mobility of 457 cm2V-1s-1 at an inversion carrier density (Ninv) of 1 × 1013 cm-2 for asymmetrically strained SiGe PMOSFETs with Ge% of 65%-70%.
Veeresh Deshpande, Vladimir Djara, et al.
Japanese Journal of Applied Physics
Eduard Cartier, Amlan Majumdar, et al.
ESSDERC 2017
Marinus Hopstaken, John Bruley, et al.
ECS Transactions
L.F. Edge, T. Vo, et al.
Applied Physics Letters