Publication
Applied Physics Letters
Paper
Fabrication of ultrathin magnetic structures by nanostencil lithography in dynamic mode
Abstract
The fabrication of magnetic elements containing constrictions is demonstrated using nanostencil lithography in dynamic mode, i.e., by a continuous translation of a shadow mask with respect to the sample. The authors quantify the current resolution limits of this technique, demonstrating edge profile widths of 120 nm and thickness variations of 10%, and discuss prospects and challenges of dynamic nanostencil lithography. © 2007 American Institute of Physics.