Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
We present a detailed ultraviolet and x-ray photoelectron spectroscopy investigation of the electronic structure of three bulk iridium silicide compounds, IrSi, IrSix (x1.6), and IrSi3. We observed a narrowing of the iridium d band and a concomitant broadening of the Si 2p band in the silicides which indicate that the bonding in these compounds is caused by a hybridization of the Ir d states and the Si sp hybrids. This is consistent with bonding models proposed for 3d and 4d transition-metal silicides. However, a d-band shift was not observed as reported in other transition-metal silicides. Also, we found that IrSi and IrSi3 are metallic. However, we observed that IrSix (x1.6) is a semiconductor, in agreement with earlier work. We discuss this difference in terms of chemical trends in the bonding of iridium silicide compounds. © 1986 The American Physical Society.
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
Min Yang, Jeremy Schaub, et al.
Technical Digest-International Electron Devices Meeting
William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010
Daniel J. Coady, Amanda C. Engler, et al.
ACS Macro Letters