Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
As a continued effort to improve the performance of low energy scanning electron probe systems for application in microscopy, lithography, metrology, etc., miniaturized electron beam columns, approximately 3 mm in length, demonstrating a probe size of 10 nm with a beam current of ≥ 1 n A at 1 keV, have been successfully developed. This paper presents current status, future directions and potential applications of these microcolumns.
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
William G. Van der Sluys, Alfred P. Sattelberger, et al.
Polyhedron
Revanth Kodoru, Atanu Saha, et al.
arXiv
Sung Ho Kim, Oun-Ho Park, et al.
Small