Electroless deposition of NiB on 15 inch glass substrates for the fabrication of transistor gates for liquid crystal displays

Abstract

The electroless deposition of NiB on 15 inch glass substrates for the fabrication of transistor gates for liquid crystal displays was studied. The methods to fabricate the gate metal lines of the thin-film transistor (TFT) array in a potentially cost-effective way, by depositing the metal layer of the TFT array using electroless deposition (ELD) and by patterning the gates using microcontact printing were also explored. The patterning of the gate layer using a conventional photoengraving process (PEP) was also demonstrated.