L.K. Wang, A. Acovic, et al.
MRS Spring Meeting 1993
Thiol-ene photopolymers were studied as patternable resins for nanocontact molding imprint lithography. Photopolymerizable thiol and ene monomer mixtures were used, and after molding, patterned thiol-ene polymer features the size and shape of the original molds were replicated. Adhesion and release were examined and controlled by manipulating the surface chemistry of the substrate and mold. A direct correlation between cured thiol-ene polymer modulus and pattern fidelity was observed. © 2007 American Chemical Society.
L.K. Wang, A. Acovic, et al.
MRS Spring Meeting 1993
T. Schneider, E. Stoll
Physical Review B
Ellen J. Yoffa, David Adler
Physical Review B
Robert W. Keyes
Physical Review B