O.F. Schirmer, K.W. Blazey, et al.
Physical Review B
This paper describes a technique to determine the presence and uniformity of Helium in the mask/wafer gap of x-ray lithography steppers by utilizing the oxygen sensitive resist polychlorostyrene (PSC). Results obtained at the IBM Advanced Lithography Facility using a SUSS stepper and the HELIOS superconducting synchrotron storage ring are presented. © 1995 Elsevier Science B.V. All rights reserved.
O.F. Schirmer, K.W. Blazey, et al.
Physical Review B
S. Cohen, T.O. Sedgwick, et al.
MRS Proceedings 1983
Shaoning Yao, Wei-Tsu Tseng, et al.
ADMETA 2011
Mark W. Dowley
Solid State Communications