R.J. Gambino, N.R. Stemple, et al.
Journal of Physics and Chemistry of Solids
This paper describes a technique to determine the presence and uniformity of Helium in the mask/wafer gap of x-ray lithography steppers by utilizing the oxygen sensitive resist polychlorostyrene (PSC). Results obtained at the IBM Advanced Lithography Facility using a SUSS stepper and the HELIOS superconducting synchrotron storage ring are presented. © 1995 Elsevier Science B.V. All rights reserved.
R.J. Gambino, N.R. Stemple, et al.
Journal of Physics and Chemistry of Solids
J.A. Barker, D. Henderson, et al.
Molecular Physics
A.B. McLean, R.H. Williams
Journal of Physics C: Solid State Physics
P.C. Pattnaik, D.M. Newns
Physical Review B