Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
We present simulation friendly detectability conditions for 2D Navier–Stokes Equation (NSE) with periodic boundary conditions, and describe a generic class of “detectable” observation operators: it includes pointwise evaluation of NSE's solution at interpolation nodes, and spatial average measurements. For “detectable” observation operators we design a global infinite-dimensional observer for NSE with uncertain possibly destabilizing inputs: in our numerical experiments we illustrate H1-sensitivity of NSE to small perturbations of initial conditions, yet the observer converges for known and uncertain inputs.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Richard M. Karp, Raymond E. Miller
Journal of Computer and System Sciences
Jonathan Ashley, Brian Marcus, et al.
Ergodic Theory and Dynamical Systems
Moutaz Fakhry, Yuri Granik, et al.
SPIE Photomask Technology + EUV Lithography 2011