Ming L. Yu
Physical Review B
The use of a dedicated chamber to perform pre-epi deposition cleaning allows native oxide removal with a low thermal budget, and significantly improves throughput of low-temperature Si and SiGe applications. Wafers processed in the cleaning chamber show no detectable contaminants, and the cleansed surface is actually significantly smoother because of cleaning down to a sub-angstrom level.
Ming L. Yu
Physical Review B
L.K. Wang, A. Acovic, et al.
MRS Spring Meeting 1993
Imran Nasim, Melanie Weber
SCML 2024
David B. Mitzi
Journal of Materials Chemistry