Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Paper
Constrained extremal problems for families of Stieltjes integrals
Related
Martin Charles Golumbic, Renu C. Laskar
Discrete Applied Mathematics
Conference paper
Neave effect also occurs with Tausworthe sequences
Shu Tezuka
WSC 1991
Y.Y. Li, K.S. Leung, et al.
J Combin Optim