Coating, mechanical constraints, and pressure effects on electromigration

N.G. Ainslie; F.M. D&#039;Heurle; O.C. Wells

doi:10.1063/1.1654097

Applied Physics Letters

Paper

22 Oct 2003

Coating, mechanical constraints, and pressure effects on electromigration

View publication

Abstract

The effect of the mechanical constraints exerted by coatings upon electromigration in thin films is evaluated on the basis of known pressure effects upon diffusion. © 1972 The American Institute of Physics.

Paper

Coherent superconducting behavior of two metals (Al-Pb) in a synthetic filamentary structure

D.P. Seraphim, F.M. D'Heurle, et al.

Applied Physics Letters

Paper

Exploring thin-film reactions by means of simultaneous x-ray surface roughness and resistance measurements

C. Lavoie, C. Cabral Jr., et al.

Defect and Diffusion Forum

Paper

Stability of C49 and C54 phases of TiSi₂ under ion bombardment

S. Motakef, J.M.E. Harper, et al.

Journal of Applied Physics

Paper

Automatic Positioning of Device Electrodes Using the Scanning Electron Microscope

O.C. Wells, T.E. Everhart, et al.

IEEE T-ED

View all publications

Abstract

Related

Coherent superconducting behavior of two metals (Al-Pb) in a synthetic filamentary structure

Exploring thin-film reactions by means of simultaneous x-ray surface roughness and resistance measurements

Stability of C49 and C54 phases of TiSi2 under ion bombardment

Automatic Positioning of Device Electrodes Using the Scanning Electron Microscope

Stability of C49 and C54 phases of TiSi₂ under ion bombardment