A. Gupta, R. Gross, et al.
SPIE Advances in Semiconductors and Superconductors 1990
We have developed a technique for both mastering and replicating data patterns for potential use in an atomic force microscope (AFM)-based data storage device. The process consists of using electron beam lithography to write data features as small as 50 nm and a photopolymerization process to faithfully replicate the written marks. The replicas can be read using a contact-mode AFM tip on a rotating disk, and no change in the signal is seen after 12 days of continuous reading. © 1997 American Vacuum Society.
A. Gupta, R. Gross, et al.
SPIE Advances in Semiconductors and Superconductors 1990
H.D. Dulman, R.H. Pantell, et al.
Physical Review B
M. Hargrove, S.W. Crowder, et al.
IEDM 1998
S.F. Fan, W.B. Yun, et al.
Proceedings of SPIE 1989