Gregory Czap, Kyungju Noh, et al.
APS Global Physics Summit 2025
Capillary forces naturally present during normal drying of photoresist materials were eliminated by developing a supercritical drying process. Supercritical carbon dioxide, organic solvents and surfactants were used to prevent the collapse of high-aspect-ratio structures fabricated from aqueous-based photoresist. The replacement of the aqueous rinse by n-hexane mediated by a compatible surfactant was introduced.
Gregory Czap, Kyungju Noh, et al.
APS Global Physics Summit 2025
Douglass S. Kalika, David W. Giles, et al.
Journal of Rheology
S. Cohen, T.O. Sedgwick, et al.
MRS Proceedings 1983
U. Wieser, U. Kunze, et al.
Physica E: Low-Dimensional Systems and Nanostructures