Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
In this work we propose a direct method for solving systems of linear equations which is based on a successive LU-decomposition of matrices of the form I + uvr. Simultaneously, the factors of an LU-decomposition of the coefficient matrix are obtained. A specific choice of the “rank-one decomposition” of the given matrix leads to a variant of the Gauss elimination process. © 1987, Taylor & Francis Group, LLC. All rights reserved.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Juliann Opitz, Robert D. Allen, et al.
Microlithography 1998
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
Paul J. Steinhardt, P. Chaudhari
Journal of Computational Physics