Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
A simple method is shown for computing the Airy stress function for two-dimensional problems. The method is applied to a simple mechanics example and to large computer-generated atomic models whose properties are independent of some coordinate z. The method has recently proved useful for analyzing topological defects in computer-generated models of amorphous solids. © 1981.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Igor Devetak, Andreas Winter
ISIT 2003
David Cash, Dennis Hofheinz, et al.
Journal of Cryptology
J.P. Locquet, J. Perret, et al.
SPIE Optical Science, Engineering, and Instrumentation 1998