About cookies on this site Our websites require some cookies to function properly (required). In addition, other cookies may be used with your consent to analyze site usage, improve the user experience and for advertising. For more information, please review your options. By visiting our website, you agree to our processing of information as described in IBM’sprivacy statement. To provide a smooth navigation, your cookie preferences will be shared across the IBM web domains listed here.
Publication
IEEE Transactions on CPMT
Paper
3-D Die Stacking with 55 μm Pitch Interconnections on Advanced Ground-Rule Laminate for Artificial Intelligence System
Abstract
In this letter, we have demonstrated a packaging technique for 3-D IC with Cu back-end-of-the line (BEOL) on a mixed pitch (55 and 75~\mu \text{m} ) advanced ground-rule laminate by developing a 3-D die-stack on substrate (3D-DSS) technology. 3-D DSS is a new assembly technology to address issues caused by warpage and mechanical stress response of 3-D integration packaging when bonding a thin through-silicon via (TSV) die on an organic substrate. The 35\,\,\text {mm} \times 35 mm test substrate has high density interconnects which include four wiring layers with thin film insulators on the chip mounting side of conventional buildup layers. A minimum 2 \mu \text{m} /2 \mu \text{m} line/space is constructed on this advanced ground-rule laminate. The experimental results showed that the 3-D DSS method can effectively prevent microbump opens or shorts, and can produce good solder joints between thin TSV die in a 3-D configuration on a fine, mixed pitch laminate.