Etching of iridium thin films in chlorine- and fluorine-based inductively coupled plasmas
- Juliano Borges
- Hongwen Yan
- et al.
- 2024
- SPIE Advanced Lithography 2024
Publications
7 results at SPIE Advanced Lithography 2024
Disruptive non-fluorinated photoacid generators using computational chemistry and library design
- P. Labeaume
- K. Hernandez
- et al.
- 2024
- SPIE Advanced Lithography 2024
Identifying trends in photoresist polymer properties to improve line and space defects Considerations to Improve Microbridge Defectivity in EUV Chemically Amplified Photoresists
- Benjamin D. Rafael-Naab
- Jong Keun Park
- et al.
- 2024
- SPIE Advanced Lithography 2024
Impact of increasing EUV absorption of CAR polymers on lithographic performance
- Yinjie Cen
- Emad Aqad
- et al.
- 2024
- SPIE Advanced Lithography 2024
Novel spin-on overcoat materials for EUV photoresist enhancement
- Xisen Hou
- Yinjie Cen
- et al.
- 2024
- SPIE Advanced Lithography 2024
Advanced EUV CAR small molecule compounds design and its impact to etch performance
- Yinjie Cen
- Jong Keun Park
- et al.
- 2024
- SPIE Advanced Lithography 2024
Acid generation efficiency prediction by bond cleavage calculation of EUV photoacid generators
- Jayoung Koo
- YunJi Kim
- et al.
- 2024
- SPIE Advanced Lithography 2024