Publications

3 results at SPIE Photomask Technology + EUV Lithography 2008

Improvements in accuracy of dense OPC models
- - Chidam Kallingal
  - James Oberschmidt
  - et al.
- 2008
- SPIE Photomask Technology + EUV Lithography 2008
Evaluation of 32nm Advanced immersion lithography pellicles
- - N. Zhou
  - K. Racette
  - et al.
- 2008
- SPIE Photomask Technology + EUV Lithography 2008
Optimizing Models Based OPC fragmentation using genetic algorithms
- - Domenico A. Dipaola
  - Ian Mobert
- 2008
- SPIE Photomask Technology + EUV Lithography 2008

Improvements in accuracy of dense OPC models