Automated sample plan selection for OPC modeling
- Nathalie Casati
- Maria Gabrani
- et al.
- 2014
- SPIE Advanced Lithography 2014
Publications
3544 results for Mathematical Sciences
Rapid, accurate improvement in 3D mask representation via input geometry optimization and crosstalk
- David Fryer
- Michael Lam
- et al.
- 2014
- SPIE Advanced Lithography 2014
CDSEM AFM hybrid metrology for the characterization of gate-all-around silicon nano wires
- Shimon Levi
- Ishai Schwarzband
- et al.
- 2014
- SPIE Advanced Lithography 2014
Closed-loop high-speed 3D thermal probe nanolithography
- Armin W. Knoll
- Michal Zientek
- et al.
- 2014
- SPIE Advanced Lithography 2014
Leveraging data analytics, patterning simulations and metrology models to enhance CD metrology accuracy for advanced IC nodes
- Narender Rana
- Yunlin Zhang
- et al.
- 2014
- SPIE Advanced Lithography 2014
Towards electrical testable soi devices using directed self-assembly for fin formation
- Chi Chun Liu
- Cristina Estrada-Raygoza
- et al.
- 2014
- SPIE Advanced Lithography 2014
ICE: Ionic contrast enhancement for organic solvent negative tone develop
- Linda K. Sundberg
- Gregory M. Wallraff
- et al.
- 2014
- SPIE Advanced Lithography 2014
Molecular glass resists for scanning probe lithography
- Christian Neuber
- Andreas Ringk
- et al.
- 2014
- SPIE Advanced Lithography 2014
Short-term forecasting of cloud images using local features
- Wenhui Jiang
- Fei Su
- et al.
- 2013
- ICGIP 2013
Precise CD-SEM metrology of resist patterns at around 20 nm for 0.33NA EUV lithography
- Nobuhiro Okai
- Erin Lavigne
- et al.
- 2014
- SPIE Advanced Lithography 2014