Publications

358 results at Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Synchrotron x-ray diffraction and transmission electron microscopy studies of interfacial reaction paths and kinetics during annealing of fully-002-textured Al/TiN bilayers
- - J.-S. Chun
  - J.R.A. Carlsson
  - et al.
- 2001
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Surface etching mechanism of silicon nitride in fluorine and nitric oxide containing plasmas
- - B.E. Kastenmeier
- 2001
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Technology for the fabrication of ultrashort channel metal–oxide–semiconductor field-effect transistors
- - J. Knoch
  - J. Appenzeller
  - et al.
- 2001
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Gas utilization in remote plasma cleaning and stripping applications
- - B.E. Kastenmeier
  - G.S. Oehrlein
  - et al.
- 2000
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Transfer etching of bilayer resists in oxygen-based plasmas
- - A. Mahorowala
  - K. Babich
  - et al.
- 2000
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Reactive ion etch of 150 nm Al lines for interconnections in dynamic random access memory
- - G. Stojakovic
  - X.J. Ning
- 2000
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Effect of inert gas additive on Cl₂-based inductively coupled plasma etching of NiFe and NiFeCo
- - K.B. Jung
  - H. Cho
  - et al.
- 1999
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Investigation of slider surfaces after wear using photoemission electron microscopy
- - Simone Anders
  - Thomas Stammler
  - et al.
- 1999
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Current-induced nanochemistry: Local oxidation of thin metal films
- - R. Martel
  - Th. Schmidt
  - et al.
- 1999
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Patterning of NiFe and NiFeCo in CO/NH₃ high density plasmas
- - K.B. Jung
  - J. Hong
  - et al.
- 1999
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films