The Effects of Pressure, Temperature, and Time on the Annealing of lonizing Radiation Induced Insulator Damage in N-channel IGFET's
- A. Reisman
- C.J. Merz
- 2019
- JES
Publications
509 results at JES
Mechanisms of Electroless Metal Plating: I. Application of the Mixed Potential Theory
- Perminder Bindra
- Judith Tweedie
- 2019
- JES
Reactive Ion Etching of GaAs in Chlorine and Resulting Surface Damage
- B.S. Lee
- H. Baratte
- 2019
- JES
Electrical studies on annealed d2 plasma-exposed silicon
- A. Henry
- O.O. Awadelkarim
- et al.
- 2019
- JES
Redeposition during Deep Trench Etching
- Jacob Jorne
- 2019
- JES
In Situ X-Ray Absorption Study of Chromium Valency Changes in Passive Oxides on Sputtered ALCr Thin Films Under Electrochemical Control
- A.J. Davenport
- H.S. Isaacs
- et al.
- 2019
- JES
Energy Considerations in the Deposition of High-Quality Plasma-Enhanced CVD Silicon Dioxide
- E. Tierney
- J. Batey
- et al.
- 2019
- JES
Various Properties of Sputter-Deposited HfB2 Films
- J.M. Eldridge
- A.R. Forouhi
- et al.
- 2019
- JES
Low Energy X-Ray and Electron Damage to IGFET Gate Insulators
- C.J. Merz
- J.R. Maldonado
- et al.
- 2019
- JES
Electro-oxidation of some soluble alkyl and aryl substituted polysilane homopolymers
- A. Diaz
- M. Baier
- et al.
- 2019
- JES